DocumentCode :
2553652
Title :
Dual sided Al/Al2O3 microchannel plasma ozone reactor
Author :
Kim, Min Hwan ; Cho, Jin Hoon ; Ban, Sung Bae ; Bae, Jung Kweon ; Park, Sung-Jin ; Eden, J.Gary
Author_Institution :
Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, 1406 W. Green St., 61801 USA
fYear :
2012
fDate :
8-13 July 2012
Firstpage :
1E-06
Lastpage :
1E-06
Abstract :
Summary form only given. Arrays of low temperature microchannel plasmas have been demonstrated to be an efficient generator of ozone in an atmospheric pressure environment.1 An on-chip chemical reactor was fabricated from Al foil by a sequence of electrochemical processes and micropowder abrasion techniques. Having a thickness of ∼ 1 mm, arrays of parallel microchannels can be stacked to yield increasing throughput. The Al/Al2O3 structure chosen for the reactor renders it well-suited for demanding operating conditions and for use with attaching and corrosive gases and vapors, in particular.
Keywords :
Aluminum oxide; Arrays; Computers; Gases; Inductors; Microchannel; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
ISSN :
0730-9244
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2012.6383326
Filename :
6383326
Link To Document :
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