DocumentCode :
2555013
Title :
Contamination analyses of Al bond pads using FIB/SEM/EDX
Author :
Zhao, S.P. ; Hua, Y.N. ; Goh, G.P. ; Guo, Z.R. ; Chau, K.W.
Author_Institution :
Failure Anal. & Reliability, Inst. of Microelectron., Singapore
fYear :
1997
fDate :
21-25 Jul 1997
Firstpage :
254
Lastpage :
259
Abstract :
Aluminum bond pads on semiconductor chips play an important role in IC device reliability and yield. Contaminated Al bond pads can cause poor intermetallic growths, thus failed or unreliable connections from the chip to the outside world. Utilizing FIB, SEM and EDX techniques, the contamination analysis may be carried out to reveal and identify defects underneath Al layer. In this study, three cases of Al bond pads with underneath contamination were investigated using this analysis approach. Based on the FIB/SEM/EDX analysis results, contamination root causes are discussed and suggested
Keywords :
X-ray chemical analysis; aluminium; focused ion beam technology; integrated circuit metallisation; ion beam applications; lead bonding; scanning electron microscopy; surface contamination; Al; EDX; FIB; IC device; SEM; aluminum bond pad; contamination analysis; defects; failure; intermetallic growth; reliability; semiconductor chip; yield; Artificial intelligence; Atherosclerosis; Failure analysis; Ion beams; Optical microscopy; Passivation; Scanning electron microscopy; Semiconductor device reliability; Surface contamination; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical & Failure Analysis of Integrated Circuits, 1997., Proceedings of the 1997 6th International Symposium on
Print_ISBN :
0-7803-3985-1
Type :
conf
DOI :
10.1109/IPFA.1997.638339
Filename :
638339
Link To Document :
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