DocumentCode
2555072
Title
Performance of the forward-biased RF-LNA with deep n-well NMOS transistor
Author
Hatta, S. F Wan Muhamad ; Soin, N.
Author_Institution
Fac. of Eng., Univ. of Malaya, Kuala Lumpur
fYear
2008
fDate
25-27 Nov. 2008
Firstpage
466
Lastpage
469
Abstract
This paper presents the merits and demerits of incorporating deep n-well (DNW) implantation NMOS structures in a forward-biased RF-Low Noise Amplifier (LNA). Two versions of a fully-integrated 2.45 GHz LNA design with forward-biasing are presented, a standard transistor version and a DNW transistor version, to evaluate potential improvements or possible degradation in performance by using a DNW structure. The RF performance characteristics of the standard LNA version are compared to the performance of the DNW LNA version. Simulation results had shown that the performance of the power gain and noise figure has been significantly boosted through the use of the DNW transistor structure as amplifying devices.
Keywords
CMOS integrated circuits; UHF amplifiers; UHF integrated circuits; integrated circuit design; low noise amplifiers; DNW transistor structure; RF performance characteristics; deep n-well NMOS transistor; deep n-well implantation; forward-biased RF-LNA; frequency 2.45 GHz; low noise amplifier; Doping; Electron mobility; Frequency; Interface states; MOSFETs; Silicon carbide; Subthreshold current; Temperature; Thermal conductivity; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics, 2008. ICSE 2008. IEEE International Conference on
Conference_Location
Johor Bahru
Print_ISBN
978-1-4244-3873-0
Electronic_ISBN
978-1-4244-2561-7
Type
conf
DOI
10.1109/SMELEC.2008.4770365
Filename
4770365
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