DocumentCode :
2555475
Title :
On-wafer integration of nitrides and Si devices: Bringing the power of polarization to Si
Author :
Chung, Jinwook W. ; Lu, Bin ; Palacios, Tomás
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear :
2009
fDate :
7-12 June 2009
Firstpage :
1117
Lastpage :
1120
Abstract :
The seamless integration of AlGaN/GaN transistors and Si CMOS electronics on the same chip will revolutionize digital and mixed signal electronics. In this talk we describe our group´s effort on demonstrating this integration. Si-GaN-Si virtual substrates have been recently fabricated through substrate removal and wafer bonding processes. The very high thermal stability of nitrides allows for the fabrication of Si CMOS electronics on these substrates without degrading the performance of the embedded nitride layer. In addition, GaN transistors on Si (001) have been fabricated on these substrates for the first time. Some of the many new circuits and devices that this integration allows include high power analog-to-digital converters, high speed differential amplifiers, normally-off power transistors, and highly-compact power regulator circuits.
Keywords :
III-V semiconductors; elemental semiconductors; gallium compounds; polarisation; silicon; thermal stability; transistors; wafer bonding; wide band gap semiconductors; AlGaN-GaN; CMOS electronics; Si; analog-to-digital converter; differential amplifiers; nitride layer; on-wafer integration; power regulator circuit; substrate removal; thermal stability; transistors; virtual substrates; wafer bonding; Aluminum gallium nitride; Analog-digital conversion; Circuit stability; Fabrication; Gallium nitride; Polarization; Thermal degradation; Thermal stability; Transistors; Wafer bonding; HEMT; High Electron Mobility Transistor; Integration; MOSFET; Nitride Semiconductors; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2009. MTT '09. IEEE MTT-S International
Conference_Location :
Boston, MA
ISSN :
0149-645X
Print_ISBN :
978-1-4244-2803-8
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2009.5165897
Filename :
5165897
Link To Document :
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