DocumentCode
2556819
Title
Inverse modeling of oxid deposition using measurements of a TEOS CVD process
Author
Sheikholeslami, A. ; Holzer, S. ; Heitzinger, C. ; Leicht, M. ; HaNaberlen, O. ; Fugger, J. ; Grasser, T. ; Selberherr, S.
Volume
2
fYear
2005
fDate
25-28 July 2005
Firstpage
79
Lastpage
82
Keywords
Analytical models; Chemical analysis; Chemical vapor deposition; Circuit simulation; Inverse problems; Level set; Microelectronics; Predictive models; Semiconductor device modeling; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Research in Microelectronics and Electronics, 2005 PhD
Print_ISBN
0-7803-9345-7
Type
conf
DOI
10.1109/RME.2005.1542941
Filename
1542941
Link To Document