DocumentCode :
2557702
Title :
Spray pyrolysis of ZnO thin films for photovoltaic applications: effect of gas flow rate and solute concentration
Author :
Mazón, C. ; Muci, J. ; Sa-Neto, A. ; Ortiz-Conde, A. ; García, F.J.
Author_Institution :
Dept. de Electronica, Univ. Simon Bolivar, Caracas, Venezuela
fYear :
1991
fDate :
7-11 Oct 1991
Firstpage :
1156
Abstract :
A study has been undertaken to establish the influence of the principal process variables governing the spray pyrolysis deposition of ZnO thin films on their electrical and optical properties as pertaining to photovoltaic applications. It shows that the temperature at which optimum ZnO thin films can be deposited by spray pyrolysis using a given set of conditions of solute concentration and carrier gas flow-rate cannot be assumed to remain unchanged for other deposition conditions. The study also shows that it is possible to find the necessary deposition conditions for producing optimum films. A methodology is presented that can be used in calculating the substrate temperature, solute concentration, and the carrier gas flow-rate that should be used to obtain films with the best photovoltaic quality possible for a given spraying system and a given type of ionic solution
Keywords :
II-VI semiconductors; pyrolysis; semiconductor thin films; solar cells; spray coatings; zinc compounds; ZnO; applications; electrical properties; gas flow rate; ionic solution; optical properties; semiconductor thin films; solute concentration; spray pyrolysis deposition; substrate temperature; Fluid flow; Optical films; Photovoltaic systems; Solar power generation; Spraying; Sputtering; Substrates; Temperature; Transistors; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-87942-636-5
Type :
conf
DOI :
10.1109/PVSC.1991.169392
Filename :
169392
Link To Document :
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