Title :
High-Efficiency Low-Crosstalk 1310-nm Polarization Splitter and Rotator
Author :
Hang Guan ; Novack, Ari ; Streshinsky, Matthew ; Ruizhi Shi ; Yang Liu ; Qing Fang ; Lim, Andy Eu-Jin ; Guo-Qiang Lo ; Baehr-Jones, Tom ; Hochberg, Michael
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
Abstract :
We demonstrate the first example of a polarization splitter and rotator (PSR) at 1310 nm built on a silicon-on-insulator platform using 248-nm deep-ultraviolet lithography. The PSR is constructed with a directional coupler, a bilevel taper-based TM0-to-TE1 mode converter, and an asymmetric Mach-Zehnder-based TE1-to-TE0 mode converter. A worst-case TM0-to-TE0 mode-conversion loss of 2 dB, with polarization crosstalk lower than -20 dB over a wide bandwidth of 40 nm is experimentally demonstrated. The worst-case polarization-dependent loss is 0.76 dB.
Keywords :
integrated optoelectronics; light polarisation; optical beam splitters; optical crosstalk; optical directional couplers; optical losses; optical rotation; silicon-on-insulator; ultraviolet lithography; Si; TM0-to-TE0 mode-conversion loss; asymmetric Mach-Zehnder-based TE1-to-TE0 mode converter; bilevel taper-based TM0-to-TE1 mode converter; deep-ultraviolet lithography; directional coupler; high-efficiency low-crosstalk polarization splitter; loss 0.76 dB; loss 2 dB; polarization rotator; polarization-dependent loss; silicon-on-insulator platform; wavelength 1310 nm; wavelength 248 nm; Directional couplers; Gratings; Loss measurement; Optimized production technology; Photonics; Silicon; Integrated optics; polarization splitter and rotator; silicon-on-insulator (SoI);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2014.2310635
