• DocumentCode
    2559151
  • Title

    Future device scaling - Beyond traditional CMOS

  • Author

    Tyagi, S. ; Auth, C. ; Ban, I. ; Chang, P. ; Chau, R. ; Ghani, T. ; Jan, C.-H. ; Kavalieros, J. ; Kuhn, K. ; Maiz, J. ; Mistry, K. ; Post, I.

  • Author_Institution
    Intel India Technol., Bangalore, India
  • fYear
    2009
  • fDate
    1-2 June 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Device scaling is critical for continuing trend of more functionality in a chip. Traditional planar CMOS scaling is increasingly difficult due to limitations in processing and material properties, device structure and reliability. In this paper we will summarize recent advances in these areas, which will enable technology scaling as per Moore´s law.
  • Keywords
    CMOS integrated circuits; semiconductor technology; CMOS; Moore law; device scaling; CMOS process; CMOS technology; Material properties; Materials reliability; Moore´s Law;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Semiconductor Technology, 2009. IEDST '09. 2nd International Workshop on
  • Conference_Location
    Mumbai
  • Print_ISBN
    978-1-4244-3831-0
  • Electronic_ISBN
    978-1-4244-3832-7
  • Type

    conf

  • DOI
    10.1109/EDST.2009.5166098
  • Filename
    5166098
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2559151