DocumentCode
2560607
Title
Reconstruction Phase Transition γ(2Ã\x974) <-> c(4Ã\x974) on (001) GaAs Surface
Author
Dmitriev, Dmitriy V.
Author_Institution
Institute of Semiconductor Physics SB RAS, Novosibirsk, Russia.
fYear
2006
fDate
1-5 July 2006
Firstpage
38
Lastpage
38
Abstract
In present study MBE equipment /spl Lt/Riber-32P/spl Gt/ with solid state sources of materials was used. The RHEED system was applied to get the diffraction patterns on reflection. The RHEED patterns changing let us determine surface reconstruction and sharply tracking reconstructional transitions. The [001] GaAs substrates with dimensional 3/spl times/3 mm/sup 2/ were used. That geometry of samples let reach the high accuracy as assigned in investigated parameters. The elections of conditions of experiment were done in connection with the fact of homoepitaxy on [001] GaAs surface from As/sub 4/ and Ga beam is the modeling system in A/sup 3/B/sup 5/ compound epitaxy. The reconstruction /spl gamma/(2/spl times/4) and c(4/spl times/4) on the [001]GaAs surface is the well example of ordered and disordered structure.
Keywords
III-V semiconductors; gallium arsenide; molecular beam epitaxial growth; reflection high energy electron diffraction; surface phase transformations; GaAs; GaAs surface; MBE equipment; RHEED patterns; RHEED system; diffraction patterns; reconstruction phase transition; reconstructional transitions; solid state sources; surface reconstruction; Diffraction; Gallium arsenide; Geometry; Molecular beam epitaxial growth; Nominations and elections; Optical reflection; Semiconductor process modeling; Solid state circuits; Substrates; Surface reconstruction;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Materials, 2006. Proceedings. 7th Annual 2006 International Workshop and Tutorials on
Conference_Location
Erlagol, Altai
ISSN
1815-3712
Print_ISBN
5-7782-0646-1
Type
conf
DOI
10.1109/SIBEDM.2006.230302
Filename
1694068
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