Title :
Interaction between a laser produced plasma and a solid substrate, in a low pressure neutral background gas
Author :
Favre, M. ; Caballero, L.S. ; Guzmán, F. ; Ruiz, H.M. ; Bhuyan, H. ; Chuaqui, H. ; Wyndham, E.S.
Author_Institution :
Pontificia Univ. Catolica de Chile, Santiago, Chile
Abstract :
Summary form only given. Pulsed laser deposition (PLD) of thin films has evolved into a well established technique. In the particular case of thin carbon films, it has been found to be suitable to grow carbon nanotubes, graphene and diamond like carbon (DLC) amongst others. Previously we have investigated PLD of thin carbon films using a graphite target, in low pressure Argon gas background. Raman spectroscopy based structural analysis of the films showed a correlation between films properties and pressure of the buffer gas background. In order to better understand the deposition process, we have studied in detail the dynamics of the laser carbon plasma close to the substrate where the carbon film grows. An Nd:YAG laser pulse, 370 mJ, 3.5 ns, at 1.0 6 μm, at 6.7 J/cm2 fluence, is used to produce a carbon plasma from a solid graphite target, in different neutral background gases, Argon, Helium and Nitrogen, at pressures below 1.5 Torr. Observations of the dynamics of the laser produced plasma, using time resolved plasma imaging, filtered with 10 nm windows at characteristic carbon species emission wavelengths, show multiple fronts of the expanding plasma, with different species composition, carbon ions and carbon molecules. When the substrate is located at 20 mm from the graphite target, we observed that a C2 rich plasma strikes the substrate and bounces, stagnating closer to the substrate for several microseconds. Besides a general characterization of the plasma dynamics close to the substrate, we will present time and space resolved optical omission spectroscopy observations, recorded with 15 ns time resolution and ~3 mm spatial resolution, at different stages of the carbon film growth process.
Keywords :
Raman spectra; argon; carbon; helium neutral atoms; plasma materials processing; plasma production by laser; plasma-wall interactions; pulsed laser deposition; thin films; Ar; C; C2 rich plasma; He; N2; Nd:YAG laser pulse; PLD process; Raman spectroscopy; argon neutral background gas; buffer gas background pressure; carbon nanotubes; carbon plasma production; carbon species emission wavelength; diamond like carbon; distance 20 mm; energy 370 mJ; expanding plasma front; film properties; film structural analysis; graphene; helium neutral background gas; laser carbon plasma dynamics; laser produced plasma dynamics; low pressure argon gas background; low pressure neutral background gas; nitrogen neutral background gas; plasma-substrate interaction; pulsed laser deposited thin films; pulsed laser deposition; solid graphite target; solid substrate; space resolved optical omission spectroscopy; thin carbon films; time 3.5 ns; time resolved plasma imaging; wavelength 1.06 mum; Carbon dioxide; Films; Gas lasers; Plasmas; Pulsed laser deposition; Solid lasers; Substrates;
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2012.6383679