• DocumentCode
    2562290
  • Title

    Wide-bandgap hydrogenated amorphous silicon carbide prepared from an aromatic carbon source

  • Author

    Nevin, W.A. ; Yamagishi, H. ; Asaoka, K. ; Tawada, Y.

  • Author_Institution
    Kaneka Corp., Kobe, Japan
  • fYear
    1991
  • fDate
    7-11 Oct 1991
  • Firstpage
    1347
  • Abstract
    By utilizing the aromatic molecule xylene, hydrogenated amorphous silicon carbide films are prepared for the first time from an aromatic carbon source. Good-quality films are obtained, over a wide range of optical bandgaps from 2.2 to 3.5 eV and carbon content from 0.4 to 0.9 atomic fraction. Infrared measurements indicate that the films contain a large amount of aromatic and olefinic sp2 carbon bonding, the extent of which depends strongly on the deposition conditions. This unsaturated carbon imparts an unusual property to the material in that it can be doped with an electron acceptor, which increases the electrical conductivity by several orders of magnitude, in a manner similar to organic semiconductors
  • Keywords
    amorphous semiconductors; bonds (chemical); electrical conductivity of amorphous semiconductors and insulators; energy gap; hydrogen; optical constants; plasma CVD; semiconductor doping; semiconductor growth; semiconductor thin films; silicon compounds; 2.2 to 3.5 eV; IR; SiC:H; amorphous semiconductor thin films; aromatic molecule xylene; bonding; deposition; doping; electrical conductivity; electron acceptor; measurements; optical bandgaps; plasma CVD; Amorphous silicon; Atom optics; Atomic layer deposition; Atomic measurements; Bonding; Conducting materials; Optical films; Organic materials; Photonic band gap; Semiconductor films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
  • Conference_Location
    Las Vegas, NV
  • Print_ISBN
    0-87942-636-5
  • Type

    conf

  • DOI
    10.1109/PVSC.1991.169427
  • Filename
    169427