DocumentCode :
2562403
Title :
The flowing afterglow of the N2-O2 discharge as a means of decontaminating/sterilising through UV irradiation: Summary of the research achieved and recent results
Author :
Moisan, M. ; Levif, P. ; Seguin, Johanne ; Barbeau, J. ; Leduc, A. ; Elmoualij, B. ; Gofflot, S. ; Heinen, E. ; Thellin, O. ; Zorzi, W.
Author_Institution :
Groupe de Phys. des Plasmas, Univ. de Montreal, Montréal, QC, Canada
fYear :
2012
fDate :
8-13 July 2012
Firstpage :
0.3
Lastpage :
0.3
Abstract :
The plasma systems for disinfection/sterilization that we have been working on are mainly based on UV irradiation while most plasma “sterilisers” are calling on ions and radicals. In the latter case, inactivation generally proceeds from erosion of the microorganisms while, in the former case, the UV photons create enough lesions to the DNA genetic material to prevent its repair. Inactivation of microorganisms through UV photons in the afterglow is, however, much slower than in the discharge itself. The UV photons stem from NO excited molecules, which are generated following the interaction of N and O atoms, in the flowing afterglow, which are coming from the dissociation of N2 and O2 in the (microwave) discharge. Since the N and O atoms can diffuse into crevices before joining into NO molecules, there is no limited accessibility of the UV photons as with a UV lamp. The NOγ molecular system shows band heads that cover almost continuously the 180-350 nm range.
Keywords :
DNA; afterglows; biological effects of ultraviolet radiation; biomolecular effects of radiation; cellular effects of radiation; discharges (electric); dissociation; genetics; microorganisms; nitrogen; oxygen; plasma applications; plasma chemistry; plasma diagnostics; sterilisation (microbiological); DNA genetic material; N2-O2; UV irradiation; UV photons; decontamination; diffusion; discharge; dissociation; erosion; excited molecules; flowing afterglow; microorganisms; plasma systems; sterilisation; wavelength 180 nm to 350 nm; Discharges (electric); Ions; Lesions; Microorganisms; Photonics; Plasmas; Radiation effects;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
ISSN :
0730-9244
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2012.6383776
Filename :
6383776
Link To Document :
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