Title :
Textured ZnO:Al films for solar cells by DC-magnetron sputtering in water vapor plasma
Author :
Nakada, Tokio ; Ohkubo, Yukinobu ; Kunioka, Akio
Author_Institution :
Dept. of Electr. Eng. & Electron., Aoyama Gakuin Univ., Tokyo, Japan
Abstract :
The successful production of low-resistive textured ZnO:Al films for solar cells by DC magnetron sputtering is discussed. The surface morphology and grain structure were strongly affected by the addition of water vapor during sputtering. Low-resistive pyramidical textured ZnO:Al films were deposited onto glass substrates in the presence of water vapor at 300-400°C. The 2 μm thick films possessed a sheet resistance of 9 Ω/□ and an optical transmission of 80% at 550 nm after annealing in a vacuum. The textured/flat-surface ZnO:Al bilayers with sheet resistance of 4 Ω/□ were also obtained
Keywords :
II-VI semiconductors; aluminium; magnetrons; plasma CVD; semiconductor doping; semiconductor thin films; solar cells; sputtering; zinc compounds; 2 micron; 300 to 400 degC; 550 nm; DC magnetron sputtering; ZnO:Al; annealing; glass substrates; grain structure; optical transmission; pyramid texturing; semiconductor thin films; sheet resistance; solar cells; surface morphology; water vapor plasma; Argon; Optical films; Photovoltaic cells; Plasmas; Production; Sputtering; Substrates; Surface morphology; Surface resistance; Surface texture;
Conference_Titel :
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-87942-636-5
DOI :
10.1109/PVSC.1991.169435
