Title :
Wafer-scale production of LEDs via wafer-bonding: achievements and challenges
Author_Institution :
Optoelectron. Div., Hewlett-Packard Co., San Jose, CA, USA
Abstract :
Advances in AlGaInP LEDs have been enabled by the development of two key technologies: metalorganic chemical vapor deposition (MOCVD) epitaxial growth and compound semiconductor wafer bonding. This talk describes the development of compound semiconductor wafer bonding techniques which have been instrumental in the development and subsequent production of transparent-substrate (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P/GaP LEDs. Furthermore, future challenges for the development of high-efficiency wafer-bonded visible LEDs are elucidated.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; wafer bonding; AlGaInP LED; AlGaInP-GaP; LED; MOCVD epitaxial growth; achievements; compound semiconductor wafer bonding; future challenges; high-efficiency; metalorganic chemical vapor deposition; transparent-substrate (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P/GaP LED; wafer-bonding; wafer-scale production; Chemical technology; Chemical vapor deposition; Epitaxial growth; Gallium arsenide; Instruments; Light emitting diodes; MOCVD; Optical films; Production; Wafer bonding;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-3160-5
DOI :
10.1109/LEOS.1996.571687