DocumentCode
2562819
Title
Recent advances in RF-LDMOS high-power IC development
Author
Burger, Wayne R.
Author_Institution
RF Div., Freescale Semicond., Tempe, AZ, USA
fYear
2009
fDate
18-20 May 2009
Firstpage
35
Lastpage
38
Abstract
RF-LDMOS is the dominant RF power device technology in the infrastructure market from cellular through WiMAX frequencies. High performance, low cost, and excellent reliability are just a few of the factors responsible for this dominant position. Base station suppliers and their customers continue to demand improvements in system efficiency while simultaneously providing lower cost solutions. RF-LDMOS continues to evolve to meet these demanding requirements. One key evolution that provides improved performance while lowering cost is the introduction of high power RFICs. By combining high Q integrated passives with RF-LDMOS device technology, multi-stage, high-power (>100 W) devices can be realized that offer superior performance and lower cost than the corresponding discrete transistor implementation can provide, with similar if not superior reliability. This paper will review recent RF-LDMOS high-power IC developments.
Keywords
MOS integrated circuits; WiMax; power integrated circuits; radiofrequency integrated circuits; IC development; RF-LDMOS; WiMAX frequencies; power device technology; Base stations; Costs; Power system reliability; Radio frequency; Radiofrequency integrated circuits; WiMAX;
fLanguage
English
Publisher
ieee
Conference_Titel
IC Design and Technology, 2009. ICICDT '09. IEEE International Conference on
Conference_Location
Austin, TX
Print_ISBN
978-1-4244-2933-2
Electronic_ISBN
978-1-4244-2934-9
Type
conf
DOI
10.1109/ICICDT.2009.5166259
Filename
5166259
Link To Document