• DocumentCode
    2562819
  • Title

    Recent advances in RF-LDMOS high-power IC development

  • Author

    Burger, Wayne R.

  • Author_Institution
    RF Div., Freescale Semicond., Tempe, AZ, USA
  • fYear
    2009
  • fDate
    18-20 May 2009
  • Firstpage
    35
  • Lastpage
    38
  • Abstract
    RF-LDMOS is the dominant RF power device technology in the infrastructure market from cellular through WiMAX frequencies. High performance, low cost, and excellent reliability are just a few of the factors responsible for this dominant position. Base station suppliers and their customers continue to demand improvements in system efficiency while simultaneously providing lower cost solutions. RF-LDMOS continues to evolve to meet these demanding requirements. One key evolution that provides improved performance while lowering cost is the introduction of high power RFICs. By combining high Q integrated passives with RF-LDMOS device technology, multi-stage, high-power (>100 W) devices can be realized that offer superior performance and lower cost than the corresponding discrete transistor implementation can provide, with similar if not superior reliability. This paper will review recent RF-LDMOS high-power IC developments.
  • Keywords
    MOS integrated circuits; WiMax; power integrated circuits; radiofrequency integrated circuits; IC development; RF-LDMOS; WiMAX frequencies; power device technology; Base stations; Costs; Power system reliability; Radio frequency; Radiofrequency integrated circuits; WiMAX;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IC Design and Technology, 2009. ICICDT '09. IEEE International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    978-1-4244-2933-2
  • Electronic_ISBN
    978-1-4244-2934-9
  • Type

    conf

  • DOI
    10.1109/ICICDT.2009.5166259
  • Filename
    5166259