DocumentCode
2563115
Title
Ultrathin diamondlike carbon films deposited by filtered carbon vacuum arcs
Author
Anders, André ; Ryan, Francis W. ; Fong, Walton ; Bhatia, C.Singh
Author_Institution
California Univ., Berkeley, CA, USA
Volume
2
fYear
2000
fDate
2000
Firstpage
541
Abstract
Ultrathin (<5 nm) hard carbon films are of great interest to the magnetic storage industry as the areal density approaches 100 Gb/in 2. These films can be used as overcoats to protect the magnetic layer. Tetrahedrally bonded amorphous carbon (ta-C) films can be produced by filtered cathodic arc deposition, however, these films will be accepted by the storage industry only if the “macroparticle” issue can be solved. Better plasma filters have been developed. Emphasis is put on the promising Twist Filter system, a compact, open-architecture structure that operates with very high current (>1 kA) in a pulsed mode. Macroparticle elimination is virtually achieved while plasma throughput is very high. Ultrathin ta-C films have been synthesized using S-filter and Twist Filter systems. Film properties such as hardness, elastic modulus, wear and corrosion resistance have been tested
Keywords
carbon; corrosion resistance; corrosion testing; elastic moduli measurement; hardness testing; magnetic storage; plasma CVD coatings; vacuum deposited coatings; wear testing; S-filter; Twist Filter system; areal density; corrosion resistance; elastic modulus; filtered carbon vacuum arc deposition; filtered cathodic arc deposition; hardness; macroparticle issue; magnetic layer protection; magnetic storage; open-architecture structure; plasma filters; pulsed mode; tetrahedrally bonded amorphous carbon films; ultrathin diamondlike carbon films; very high current; wear; Amorphous magnetic materials; Amorphous materials; Bonding; Diamond-like carbon; Filters; Magnetic films; Magnetic memory; Magnetic separation; Plasma applications; Protection;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location
Xi´an
Print_ISBN
0-7803-5791-4
Type
conf
DOI
10.1109/DEIV.2000.879046
Filename
879046
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