DocumentCode
2563207
Title
Suppression of interface-induced noise by the control of electron-phonon interactions
Author
Hammig, Mark D. ; Taehoon Kang ; Manhee Jeong ; Jarrett, Michael
Author_Institution
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
fYear
2012
fDate
Oct. 27 2012-Nov. 3 2012
Firstpage
4188
Lastpage
4195
Abstract
We study the influence of various types of contacting media and contact area on the current-fluctuation level in semiconductors, testing the supposition that the electronic noise is governed, in part, by phonon-leaking dynamics to the environment. Using passivated and gettered silicon PIN diodes as experimental test-beds, the presented data lends credence to the prediction that the phonon-refraction characteristics of the semiconductor-metal interface substantially impacts the current fluctuations in the solid. Specifically, if one implements metallic contacts with lower phonon-reflecting characteristics, such as those composed of silver or palladium, or if one increases the area through which phonons can leakage to the surrounding environment, then the leakage current decreases.
Keywords
current fluctuations; electron-phonon interactions; elemental semiconductors; interface phonons; leakage currents; p-i-n diodes; palladium; semiconductor device noise; semiconductor-metal boundaries; silicon; silver; Ag-Si; Pd-Si; contact area; contacting media; current-fluctuation level; electron-phonon interactions; electronic noise; experimental test-beds; interface-induced noise; leakage current; metallic contacts; passivated gettered silicon PIN diodes; phonon-leaking dynamics; phonon-reflecting characteristics; phonon-refraction characteristics; semiconductor-metal interface;
fLanguage
English
Publisher
ieee
Conference_Titel
Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC), 2012 IEEE
Conference_Location
Anaheim, CA
ISSN
1082-3654
Print_ISBN
978-1-4673-2028-3
Type
conf
DOI
10.1109/NSSMIC.2012.6551956
Filename
6551956
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