Title :
Installation for vacuum-arc film deposition by filtered plasma fluxes
Author :
Khoroshikh, V.M. ; Leonov, S.A. ; Belous, V.A.
Author_Institution :
Nat. Sci. Center, Kharkov Inst. of Phys. & Technol., Ukraine
Abstract :
An installation for vacuum-arc droplet-free film deposition was designed. It contains two rectilinear plasma sources, in whose cylindrical anodes the disk filtering shields are placed. The investigated variant of installation provides ion current at a level 2.4 A at a current of the arc in each of plasma sources 100 A. The deposition rate of 5 μm/h for titanium nitride films was achieved over the rotating cylindrical detail of height 50 mm and diameter of 45 mm. It is shown also that the installation allows to receive coatings by thickness up to 3 microns at the average size of microroughnesses on its surface about 0.08-0.09 microns
Keywords :
anodes; plasma deposition; plasma production; titanium compounds; vacuum arcs; vacuum deposited coatings; vacuum deposition; 0.08 micron to 0.09 m; 100 A; 2.4 A; 3 micron; 45 mm; 50 mm; TiN; cylindrical anodes; deposition rate; filtered plasma fluxes; ion current; microroughnesses; rectilinear plasma sources; vacuum-arc film deposition installation; Anodes; Cathodes; Coils; Magnetic flux; Magnetic shielding; Plasma applications; Plasma materials processing; Plasma sources; Plasma transport processes; Substrates;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location :
Xi´an
Print_ISBN :
0-7803-5791-4
DOI :
10.1109/DEIV.2000.879051
