DocumentCode :
2563269
Title :
Floating potential of an isolated macroparticle in vacuum arc deposition plasmas
Author :
Junjia, He ; Chun, LIU ; Jiyan, Zou ; Lichun, Cheng
Author_Institution :
Dept. of Electr. Power Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
Volume :
2
fYear :
2000
fDate :
2000
Firstpage :
575
Abstract :
The vacuum arc deposition (VAD) plasma, as a cathode governed plasma, is not in a local thermal equilibrium state in nature, and the ions emitted from the cathode arc spots characterize high directed velocity in excess of their thermal value. Taking this special feature into account, the charging characteristics of an isolated macroparticle immersed in a VAD plasma are analyzed. The floating potentials of the macroparticles as a result of charging are calculated under thin and thick sheath case
Keywords :
cathodes; electric potential; ion emission; plasma CVD; plasma sheaths; vacuum deposition; cathode arc spots; cathode governed plasma; floating potential; isolated macroparticle; local thermal equilibrium state; thermal value; thick sheath; thin sheath; vacuum arc deposition plasmas; Cathodes; Electrons; Nuclear and plasma sciences; Plasma properties; Plasma sheaths; Space technology; Substrates; Surface charging; Vacuum arcs; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location :
Xi´an
Print_ISBN :
0-7803-5791-4
Type :
conf
DOI :
10.1109/DEIV.2000.879054
Filename :
879054
Link To Document :
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