• DocumentCode
    2563716
  • Title

    The non-linear behavior of the Nothing On Insulator NOI nanotransistor from theoretical and numerical studies

  • Author

    Ravariu, C. ; Rusu, A.

  • Author_Institution
    ETTI, Politeh. Univ. of Bucharest, Bucharest, Romania
  • Volume
    2
  • fYear
    2011
  • fDate
    17-19 Oct. 2011
  • Firstpage
    357
  • Lastpage
    360
  • Abstract
    A brief presentation of the NOI - Nothing On Insulator - nanotransistor, followed by two theoretical points of view concerning the NOI-FET non-linearity are presented in this paper. The main target is to prove the NOI nanotransistor affiliation to the FETs family, monitoring the gate-control on the drain current. The drain current is activated by the VDS voltage under tunneling conditions. The gate terminal modulates the carriers concentration and consequently the drain current flow. Secondary, a new model parameter comes to complete the NOI-FET theory. The third order derivative was used for the extraction of a threshold drain-source voltage that splits the work domain in two conduction regions: weak and strong.
  • Keywords
    field effect transistors; nanoelectronics; NOI nanotransistor affiliation; NOI-FET nonlinearity; NOI-FET theory; drain current; nonlinear behavior; nothing on insulator nanotransistor; threshold drain-source voltage; Electric potential; FETs; Films; Logic gates; Neodymium; Silicon; Threshold voltage; FETs; Semiconductor device modeling; Thin film devices; carriers modulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2011 International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-61284-173-1
  • Type

    conf

  • DOI
    10.1109/SMICND.2011.6095816
  • Filename
    6095816