Title :
Control of charge-up on insulating glass in vacuum due to plasma processing
Author_Institution :
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
In order to control charge-up on insulating glasses used for high-voltage vacuum equipment, H2 plasma processing on the glass surface was studied. Borosilicate glass plates were used as test samples. The glasses were exposed to H2 plasma produced by AC (60 Hz) voltage application. The surface resistivity of the glass was deceased with H2 plasma processing time. By H2 plasma exposure for 20 minutes, the surface resistivity was reduced from 1017 Ω to 1012 Ω. Due to the reduction of the surface resistivity, charge-up of the glass irradiated by electron beam can be controlled to the level not to cause surface flashover
Keywords :
electrical resistivity; electrodes; electron beam effects; glass; insulator testing; plasma materials processing; vacuum breakdown; vacuum insulation; 1E12 ohm; 20 min; 60 Hz; H2; H2 plasma processing; borosilicate glass plates; electron beam irradiation; high-voltage vacuum equipment; insulating glass charge-up control; solid insulators; surface flashover; surface resistivity; Conductivity; Dielectrics and electrical insulation; Electrodes; Glass; Hydrogen; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Testing;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location :
Xi´an
Print_ISBN :
0-7803-5791-4
DOI :
10.1109/DEIV.2000.879097
