Characteristics of VHF Capacitively Coupled Plasmas in a 300 mm Etch Chamber

Summary form only given. We have investigated the characteristics of VHF capacitively coupled plasmas produced in a modified applied materials chamber. The chamber had a 14-inch diameter upper electrode (source) that was driven at 10 to 160 MHz and a 300 mm diameter electrostatic chuck with a ceramic process kit that was driven at 13.56 MHz (bias). Diagnostics employed include RF diagnostics to measure the voltage and current, Bdot probes to measure the spatial magnetic fields, a microwave interferometer to measure the line-integrated electron density, a hairpin microwave resonator to measure the spatially resolved electron density, absorption spectroscopy to determine the argon metastable temperature and density, laser induced fluorescence (LIF) to determine the spatial distribution of the excited species, and spatially resolved optical emission. Scaling of the plasma parameters with frequency, power and pressure, and implications to energy deposition models will be discussed