• DocumentCode
    2566396
  • Title

    Design and fabrication of micromechanical logic elements

  • Author

    Bergstrom, P. ; Tamagawa, T. ; Polla, D.

  • Author_Institution
    Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
  • fYear
    1990
  • fDate
    11-14 Feb 1990
  • Firstpage
    15
  • Lastpage
    20
  • Abstract
    The development of a complete micromechanical digital logic family fabricated for use in low speed applications requiring radiation immunity is presented. The micromachined devices operate by electronic linear actuation of a slider element restricted to a one-dimensional track. A novel feature of the device is the use of a sliding electrical contact. The basic structure of the device is fabricated using three LPCVD polysilicon and two sacrificial oxide deposition steps. The micromechanical logic element demonstrates robust electrical characteristics and has an operating threshold of apparently 15 volts
  • Keywords
    chemical vapour deposition; logic design; logic devices; 15 V; LPCVD; digital logic family; electrical characteristics; electronic linear actuation; micromachined devices; micromechanical logic elements; one-dimensional track; operating threshold; polysilicon; radiation immunity; sacrificial oxide deposition; slider element; sliding electrical contact; Circuits; Contacts; Electrodes; Electrostatics; Fabrication; Geometry; Inverters; Logic design; Logic devices; Micromechanical devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1990. Proceedings, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
  • Conference_Location
    Napa Valley, CA
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1990.110239
  • Filename
    110239