Title :
Thermo-reliability relationships of GaAs ICs
Author_Institution :
TriQuint Semicond. Inc., Beaverton, OR, USA
Abstract :
Thermal conductivity and failure mechanism activation energies are identified as being the key parameters for determining reliable application of GaAs ICs (integrated circuits). Differences from Si in these two areas cause no particular problems for the application of GaAs ICs, but they do require attention, especially when designing for and measuring long-term reliability. The liquid-crystal, diode-drop, and infrared measurement techniques for measuring temperature are examined, with empirical results shown for GaAs structures. The characteristics of these three methods are discussed and comparisons are made. Activation energies for GaAs and Si failure mechanisms are explained. The relationship of temperature and activation energy is provided. For example, +or-/-7 degrees C errors in measuring temperature can halve or double 150 degrees C device lifetimes for failure mechanisms with activation energies of 1.6 eV.<>
Keywords :
III-V semiconductors; failure analysis; gallium arsenide; integrated circuit technology; integrated circuit testing; life testing; monolithic integrated circuits; reliability; temperature measurement; 1.6 eV; 150 C; GaAs ICs; GaAs structures; IC testing; device lifetimes; diode drop measurement technique; empirical results; failure mechanism activation energies; infrared measurement techniques; key parameters; liquid crystal measurement technique; long-term reliability; measuring temperature; semiconductors; temperature reliability curves; thermal conductivity; thermo-reliability relationships; Application specific integrated circuits; Area measurement; Diodes; Failure analysis; Gallium arsenide; Integrated circuit measurements; Integrated circuit reliability; Particle measurements; Temperature measurement; Thermal conductivity;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1988. Technical Digest 1988., 10th Annual IEEE
Conference_Location :
Nashville, Tennessee, USA
DOI :
10.1109/GAAS.1988.11024