Title :
A GaAs MESFET 16*16 crosspoint switch at 1700 Mbits/sec
Author :
Anderson, C.J. ; Magerlein, J.H. ; Scott, G.J. ; Bermon, S. ; Callegari, A. ; Feder, J.D. ; Greiner, J.H. ; Hoh, P.D. ; Hovel, H.J. ; Pomerene, A.T.S. ; Roche, P. ; Thomas, Martyn
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
A GaAs MESFET 16x16 crosspoint switch has been fabricated on a 3-mm x 4-mm chip using a 1-μm super buffer logic (SBL) design containing approximately 10000 FETs and operating at 800 mW of power. A 99% confidence bit error rate (BER) better than 1*10/sup -3/ was obtained at 1.7 Gb/s rate using a 2/sup 7/ -1 pseudorandom NRZ (nonreturn-to-zero) sequence. The BER test was done on one path using a probe card. The chip has 255 out of 256 good crosspoints. The bad crosspoint was a repeating error from a mask defect. An advanced refractory-gate MESFET process was used to fabricate the chip. A lightly doped drain structure was used to reduce parasitic gate capacitance while maintaining acceptable source resistance, to reduce short-channel effects, to increase breakdown voltage compared to devices where the heavy source/drain implant is directly self-aligned to the gate edge.<>
Keywords :
III-V semiconductors; digital integrated circuits; electronic switching systems; field effect integrated circuits; gallium arsenide; integrated circuit technology; large scale integration; semiconductor switches; 1 micron; 1700 Mbit/s; 3 to 4 mm; 800 mW; BER test; GaAs; LDD; MESFET; SBL; bit error rate; breakdown voltage; crosspoint switch; lightly doped drain structure; mask defect; parasitic gate capacitance; pseudorandom NRZ sequences; refractory-gate MESFET process; semiconductors; short-channel effects; source resistance; super buffer logic; Bit error rate; FETs; Gallium arsenide; Logic design; MESFETs; Optical refraction; Optical signal processing; Probes; Switches; Testing;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1988. Technical Digest 1988., 10th Annual IEEE
Conference_Location :
Nashville, Tennessee, USA
DOI :
10.1109/GAAS.1988.11031