Surface Modification of Thin Dielectric Materials by Compact Theta-Pinch Plasma

Summary form only given. A new method of ion implantation and plasma coating has been tested to achieve a surface modification of a dielectric thin material which is not suited for plasma based ion implantation (PBII) method. A capacitor of 500 nF charged up to 10 kV was discharged into a 3 cm wide, single-turn coil which surrounds a glass tube of 20 mm O.D. and 16.6 mm I.D. The coil current having 15 kA peak and period of 1.54 micro-sec induced a electric field which had the maximum value at the inner surface of the glass tube. Before applying the oscillating electric field, nitrogen gas was filled to 10 Pa and weekly ionized by a capacitively coupled 10 kHz voltage source. The plasma current initiated at first and the plasma column contracted at third period of the coil current. The plasma column was compressed from 16.6 mm to 4 mm in diameter within 500 nsec by a Lorentz force caused by the axial magnetic field and the azimuthal plasma current. The coil current continued to flow for 20 micro-sec, so the plasma contracted and expanded repeatedly. Nitrogen ion was confirmed by spectrum analysis. PTFE (polytetrafluoroethylene) rod with 2 mm in diameter was placed at the center of the tube. The surface showed hydrophilic after treatment by the pinch plasma. Ion implantation was done by this compressed kinetic energy to the target. By using this method, one can easily produce and deposit metallic materials on the surface of the rod, because the large electric field at the inner surface of the tube vaporises and ionizes the metal films placed at the wall. During the contraction and expansion period, the metallic plasma interacted with the rod repeatedly. After several shots, the metal was deposited and implanted into the rod surface