DocumentCode
2570009
Title
Spectroscopic Modeling and Comparison of Radiation from X-Pinches and Wire Arrays Produced on the 1 MA Pulsed Power Generator at UNR
Author
Safronova, A. ; Kantsyrev, V. ; Ouart, N. ; Yilmaz, Ferkan ; Esaulov, A. ; Fedin, Dmitry ; Astanovitsky, A. ; LeGalloudec, B. ; Batie, S. ; Cowan, T. ; Jones, B. ; Coverdale, C. ; Deeney, C. ; LePell, D.
Author_Institution
Dept. of Phys., Nevada Univ., Reno, NV
fYear
2005
fDate
20-23 June 2005
Firstpage
219
Lastpage
219
Abstract
Summary form only given. X-ray spectra and images from Al (with 5% of Mg and some with 5% of NaF dopants) and Cu (pure and with 4% of Ni) wire arrays and X-pinches were accumulated in experiments on the 1 MA pulsed power generator at UNR. In particular, axially and radially resolved K-shell X-ray spectra of Al, Mg, and Na and L-shell X-ray spectra of Cu and Ni were recorded by a KAP crystal (in a spectral region from 6 to 15 Aring) through different slits from 50 mum to 3 mm. In addition, spatially integrated harder X-ray spectra were monitored by a LiF crystal. Non-LTE kinetic models of Al, Mg, and Na, and of Cu and Ni provided spatially resolved electron temperatures and densities for experiments with Al and Cu loads, respectively. Advantages of using alloys and dopants with small concentrations for spectroscopic plasma diagnostics will be presented. Dependence of the plasma´s spatial structures, temperatures, and densities from wire material and load configurations, sizes, and masses will be discussed
Keywords
Z pinch; aluminium alloys; copper alloys; magnesium alloys; nickel alloys; plasma X-ray sources; plasma density; plasma diagnostics; plasma kinetic theory; plasma temperature; 1 MA; 50 to 3000 mum; 6 to 15 angstrom; AlMg; CuNi; K-shell X-ray spectra; KAP crystal; L-shell X-ray spectra; LiF crystal; X-pinches; electron densities; electron temperatures; kinetic models; pulsed power generator; spectroscopic plasma diagnostics; wire arrays; Monitoring; Plasma diagnostics; Plasma temperature; Power generation; Pulse generation; Semiconductor process modeling; Spatial resolution; Spectroscopy; Wire; X-ray imaging;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location
Monterey, CA
ISSN
0730-9244
Print_ISBN
0-7803-9300-7
Type
conf
DOI
10.1109/PLASMA.2005.359267
Filename
4198526
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