DocumentCode :
2570259
Title :
Effect the Heat on the Growth Copper Film Sputtered on the Zinc Substrate in Different Conditions
Author :
Bahadori, F. ; Mahmoudzadeh, M.
Author_Institution :
Dept. of Plasma Phys., METU, Ankara
fYear :
2005
fDate :
20-23 June 2005
Firstpage :
227
Lastpage :
227
Abstract :
Summary form only given. In this paper we investigated the effect of high temperature on the growth of copper film on the zinc substrate in different conditions of variation of magnetic field and changing the gases. Then we also discussed the possibility of sputtering thin films in the optimum conditions
Keywords :
copper; metallic thin films; plasma materials processing; sputter deposition; Cu; Zn; copper film growth; high-temperature effect; magnetic field variation; thin film sputtering; zinc substrate; Argon; Atmospheric-pressure plasmas; Copper; Helium; Physics; Plasma applications; Plasma diagnostics; Plasma temperature; Substrates; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
ISSN :
0730-9244
Print_ISBN :
0-7803-9300-7
Type :
conf
DOI :
10.1109/PLASMA.2005.359282
Filename :
4198541
Link To Document :
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