DocumentCode :
2570337
Title :
Surface Modification of Polyimide Films by DBD Atmospheric Pressure Plasma for Copper Metallization
Author :
Yoon-Ho Choi ; Ji-Hun Kim ; Yong-Seok Hwang
Author_Institution :
Dept. of Nucl. Eng., Seoul Nat. Univ.
fYear :
2005
fDate :
20-23 June 2005
Firstpage :
229
Lastpage :
229
Abstract :
Summary form only given. It is important to improve the adhesive strength between polyimide film and metal in microelectronics packaging. Surface modification of polyimide film by DBD atmospheric pressure plasmas are carried out to enhance the adhesion of the polymer with sputtered copper. In this study, N2 atmospheric pressure plasmas are generated and their influence on surface modification has been investigated. N2 meta-stable species such as N2 (A3Sigmau +) play a very important role in the surface treatment of polymer because of their high-energy contents. The N2 meta-stable densities with various discharge conditions are estimated by 1-D discharge simulation with spectroscopic measurements, and they are correlated with the change of adhesion strength. In addition, atmospheric plasmas with other gases such as O2, air, He and Ar are used for the surface modification of polyimide and compared with N2 plasmas. Improved adhesion between polyimide and sputtered copper can be explained by chemical and mechanical changes of polyimide surface imposed by plasma particles. These surface analyses are performed by XPS and AFM
Keywords :
X-ray photoelectron spectra; adhesion; atomic force microscopy; copper; metallisation; plasma materials processing; polymer films; surface treatment; 1D discharge simulation; AFM; Cu; XPS; adhesive strength; atmospheric pressure plasma; copper metallization; metastable densities; microelectronics packaging; polyimide films; spectroscopic measurements; surface treatment; Adhesives; Atmospheric-pressure plasmas; Copper; Metallization; Plasma applications; Plasma chemistry; Plasma measurements; Polyimides; Polymer films; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
ISSN :
0730-9244
Print_ISBN :
0-7803-9300-7
Type :
conf
DOI :
10.1109/PLASMA.2005.359287
Filename :
4198546
Link To Document :
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