Title :
Modeling of temperature characteristics for metal-ferroelectric-insulator-semiconductor devices
Author :
Tang, J.X. ; Tang, M.H. ; Yang, F. ; Zhang, J.J. ; Zhou, Y.C. ; Zheng, X.J.
Author_Institution :
Xiangtan Univ., Hunan
Abstract :
Modeling of temperature characteristics for metal-ferroelectric-insulator-semiconductor devices is given in detail in this paper. Based on the Miller model, the polarization, the electric field in ferroelectric layer, surface potential, and drain-to-source current with gate voltage are investigated over a wide temperature range from 300 K to 600 K. From the model results, for the first time, we find that the semiconductor substrate can lead to the ferroelectric imprint under different temperatures, and there exists a zero-temperature-coefficient bias point in the transfer characteristic curves as conventional metal-oxide-semiconductor devices.
Keywords :
electron mobility; ferroelectric devices; insulated gate field effect transistors; surface potential; temperature distribution; MFIS-FET devices; Miller model; drain-to-source current; electron mobility; ferroelectric imprint; ferroelectric layer; ferroelectric-gate field effect transistor; metal-ferroelectric-insulator-semiconductor devices; semiconductor substrate; surface potential; temperature 300 K to 600 K; temperature characteristics; transfer characteristic curves; zero-temperature-coefficient bias point; Electron mobility; Ferroelectric materials; Inorganic materials; Magnetic field induced strain; Optical scattering; Rough surfaces; Substrates; Surface roughness; Temperature dependence; Voltage; MFIS-FET; Temperature; ZTC point;
Conference_Titel :
ASIC, 2007. ASICON '07. 7th International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4244-1132-0
Electronic_ISBN :
978-1-4244-1132-0
DOI :
10.1109/ICASIC.2007.4415813