Title :
Surface Sterilization with High Energy Ions
Author :
Schmidt, J. ; Meixler, L.
Author_Institution :
Princeton Plasma Phys. Lab., NJ
Abstract :
Summary form only given. There is a commercial need for the sterilization of food containers in the bottling and packaging industry, and other plastic surfaces that will destroy bacterial spores and other microbes on a short time scale and without chemical agents. We have demonstrated that high-energy (e.g. 50 KeV) ions, extracted from a low-density hydrogen plasma using an ion implantation approach, impart sufficient spore damage to prevent germination. Recently, we have carried out additional studies on variations of a number of parameters, such as the total ion dose, voltage variations, pulse width, ion species and background pressure. The experiments are conducted in a 1 meter long, 8 inch diameter chamber under a modest vacuum. An R.F. plasma is established using a 7 watt, 25 MHz source. The spores are placed on 1-inch diameter solid brass spheres by a biological testing service. The spheres are inserted into the chamber prior to initiation of the plasma, then pulsed with a high voltage pulser to a nominally 50000 volt negative bias, thereby attracting the positive plasma ions to the surface of the brass spheres. Typically, 4000 individual negative pulses are applied over an 8 second period and then the sample is removed and analyzed. The results indicate that spore destruction occurs over a wide range of parameters and is indicative of the potential to destroy spores in one second or less
Keywords :
biological effects of ionising particles; hydrogen; microorganisms; plasma immersion ion implantation; plasma sources; plasma-wall interactions; 25 MHz; 7 W; H2; RF plasma; bacterial spores; biological testing; bottling industry; ion implantation; low-density hydrogen plasma; microbes; packaging industry; solid brass spheres; spore destruction; surface sterilization; Bottling; Chemical industry; Containers; Food industry; Fungi; Plasma applications; Plasma immersion ion implantation; Plasma sources; Plastic packaging; Voltage;
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-9300-7
DOI :
10.1109/PLASMA.2005.359343