• DocumentCode
    2571493
  • Title

    Design optimization of microwave power heterojunction bipolar transistor cells

  • Author

    Wang, G.W. ; Yang, L.W. ; Laird, R.W. ; Williams, D.A. ; Sadowski, J.P. ; Wright, P.D.

  • Author_Institution
    Ford Microelectron. Inc., Colorado Springs, CO, USA
  • fYear
    1989
  • fDate
    13-15 June 1989
  • Firstpage
    1061
  • Abstract
    Results of a design optimization study of power heterojunction bipolar transistor (HBT) cells are presented. AlGaAs-GaAs HBTs have been fabricated using a simple heterostructure design grown by molecular beam epitaxy and a novel self-aligned fabrication process which offers relatively low parasitics. The influence of power transistor cell design on device performance is emphasized. The design optimization study involved simultaneous fabrication of transistor cells with a relatively wide range of geometries. Transistors with a wide range of emitter finger sizes and number, but with the same number of collector contacts and the same basic cell design approach, have been fabricated and characterized by DC and microwave testing. The test results indicate that HBTs with more than three fingers do not exhibit a higher maximum current and that adding emitter fingers in this design merely increases the parasitic base-collector capacitance and drastically reduces f/sub T/ and f/sub MAG/. In contrast, using a similar number of longer emitter fingers yields devices with the highest maximum current density while maintaining acceptable high-frequency performance.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; power transistors; solid-state microwave devices; AlGaAs-GaAs; DC performance; HBT; HF performance; III-V semiconductors; MBE; S-parameter measurements; design optimization; device geometry variation; device performance; emitter finger sizes; heterojunction bipolar transistor; high-frequency performance; microwave power transistors; molecular beam epitaxy; parasitic base-collector capacitance; power transistor cell design; self-aligned fabrication process; Design optimization; Fabrication; Fingers; Geometry; Heterojunction bipolar transistors; Microwave transistors; Molecular beam epitaxial growth; Parasitic capacitance; Power transistors; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 1989., IEEE MTT-S International
  • Conference_Location
    Long Beach, CA, USA
  • Type

    conf

  • DOI
    10.1109/MWSYM.1989.38905
  • Filename
    38905