Title :
Blue/ultraviolet sensitive detector on <100> silicon membrane
Author :
Purica, Munizer ; Budianu, Elena ; Elena, Manea
Author_Institution :
Nat. Inst. for Res. & Dev. in Microtechnologies, Bucharest, Romania
Abstract :
In this paper, attention has been focused on two major aspects: fabrication of a low dark silicon photodiode with enhanced responsivity for blue/ultraviolet radiation (λ∈ 200-400 μm) by arsenic diffusion, using as planar source arsenic doped oxide deposited by LPCVD on the active area, and development of a post process step for obtaining a <100> silicon membrane of ∼10 μm by using aqueous alkaline etching (KOH) without modifying the opto-electrical parameters of the photodiode structures.
Keywords :
chemical vapour deposition; diffusion; elemental semiconductors; etching; membranes; micromachining; photodetectors; photodiodes; silicon; ultraviolet detectors; 10 micron; 200 to 400 micron; KOH; KOH aqueous alkaline etching; LPCVD; Si:As; active area; arsenic doped oxide; blue/ultraviolet sensitive detector; opto-electrical parameters; photodiode structures; planar arsenic diffusion source; post process step; responsivity; silicon <100> membrane; silicon photodiode; Biomembranes; Fabrication; Impurities; Infrared detectors; Optical surface waves; P-n junctions; Photodiodes; Radiation detectors; Silicon carbide; Substrates;
Conference_Titel :
Semiconductor Conference, 2002. CAS 2002 Proceedings. International
Print_ISBN :
0-7803-7440-1
DOI :
10.1109/SMICND.2002.1105833
