DocumentCode
2572082
Title
New self-aligned micromachining process for large free-space optical cross-connects
Author
Helin, Philippe ; Bourouina, Tarik ; Mita, Makoto ; Reyne, Gilbert ; Fujita, Hiroyuki
Author_Institution
LIMMS, Tokyo Univ., Japan
fYear
2000
fDate
2000
Firstpage
119
Lastpage
120
Abstract
An improved self-aligned micromachining process for large-scale free-space optical cross-connect is presented. It satisfies the high accuracy optical alignment required for such application. This self-aligned batch process allows the simultaneous fabrication of vertical mirrors and fiber guides. It is performed in one level of mask lithography and combines deep RIE and KOH silicon etching
Keywords
etching; micro-optics; micromachining; mirrors; optical fabrication; optical switches; silicon; sputter etching; Si; bypass switch; deep RIE; fiber guides; high accuracy optical alignment; large free-space optical cross-connects; self-aligned batch process; self-aligned micromachining process; simultaneous fabrication; single mask lithography level; vertical mirrors; wet anisotropic etching; Anisotropic magnetoresistance; Fabrication; Large-scale systems; Lithography; Micromachining; Mirrors; Optical fiber networks; Optical switches; Silicon; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS, 2000 IEEE/LEOS International Conference on
Conference_Location
Kauai, HI
Print_ISBN
0-7803-6257-8
Type
conf
DOI
10.1109/OMEMS.2000.879655
Filename
879655
Link To Document