Title :
Photoplott based masking alternatives for use in micromechanics, microoptics and microelectronics
Author :
Dumbrávescu, N. ; Dascalu, E.
Author_Institution :
Nat. Inst. for R&D in Microtechnologies, Bucharest, Romania
Abstract :
This paper reports on different ways to use photoplot type films in the field of microtechnologies. Three such possibilities are presented below: direct contact masking; reticles for projection objectives (1:5 and 1:10); mask fabrication based on scale reduction of a photoplot type film.
Keywords :
laser printers; masks; micro-optics; micromachining; plotters; reticles; direct contact masking; laser photoplotting; mask fabrication; microelectronics; micromachining; micromechanics; microoptics; microtechnologies; photoplot type film scale reduction; photoplot-based masking technology; projection objective reticles; Bellows; Design automation; Image resolution; Microelectronics; Microoptics; Optical device fabrication; Optical films; Page description languages; Printers; Switches;
Conference_Titel :
Semiconductor Conference, 2002. CAS 2002 Proceedings. International
Print_ISBN :
0-7803-7440-1
DOI :
10.1109/SMICND.2002.1105862
