Title :
Micromachined silicon nitride solid immersion lenses
Author :
Crozier, K.B. ; Fletcher, D.A. ; Kino, G.S. ; Quate, C.F.
Author_Institution :
Edward L. Ginzton Lab., Stanford Univ., CA, USA
Abstract :
We present a method for fabricating silicon nitride solid immersion lenses (SIL) integrated with atomic force microscope cantilevers. We demonstrate that a 200 nm line/space transmission grating (400 nm period) may be resolved using the SIL with λ=633 nm illumination. Based on the refractive index (~1.9 for PECVD silicon nitride) and geometry of the SIL, the effective numerical aperture is calculated to be ~1.8
Keywords :
atomic force microscopy; microlenses; micromachining; optical fabrication; plasma CVD; refractive index; silicon compounds; sputter etching; 633 nm; AFM cantilever integrated; PECVD; SiN; effective numerical aperture; fabrication method; freestanding cantilevers; improved optical resolution; lens geometry; line/space transmission grating; micromachined solid immersion lenses; plasma etching; refractive index; Apertures; Etching; Lenses; Plasma applications; Plasma chemistry; Plasma waves; Refractive index; Resists; Silicon; Solids;
Conference_Titel :
Optical MEMS, 2000 IEEE/LEOS International Conference on
Conference_Location :
Kauai, HI
Print_ISBN :
0-7803-6257-8
DOI :
10.1109/OMEMS.2000.879660
