Photoplastic SU-8 probes for near-field optical applications

Author

Brugger, Jurgen ; Kim, Beomjoon ; Niek Van Huist

Author_Institution

Strategic Res. Orientation NanoLink, Twente Univ., Enschede, Netherlands

fYear

2000

fDate

2000

Firstpage

135

Lastpage

136

Abstract

We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications

Keywords

etching; focused ion beam technology; micro-optics; micromachining; moulding; nanotechnology; near-field scanning optical microscopy; optical fabrication; optical polymers; photoresists; probes; ultraviolet lithography; FIB milling; MOEMS; SNOM probes; anisotropic etching; batch fabrication; epoxy-based EPON SU-8 resin; high aspect ratio probe; micromachining; moulds; nanoscale aperture; near-UV photoresist; near-field optical application; near-ultraviolet exposure; photoplastic SU-8 probes; photosensitized; sharp pyramidal bright probes; spin coating; transparent photoplastic; transparent probe; wafer-scale microfabrication process; Atomic force microscopy; Biomedical optical imaging; Etching; Fabrication; Optical films; Optical materials; Passive optical networks; Probes; Resists; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS, 2000 IEEE/LEOS International Conference on

Conference_Location

Kauai, HI

Print_ISBN

0-7803-6257-8

Type

conf

DOI

10.1109/OMEMS.2000.879662

Filename

879662