• DocumentCode
    2572297
  • Title

    Influence of quantum confinement effects on single electron and single hole transistors

  • Author

    Ishikuro, H. ; Hiramoto, Toshiro

  • Author_Institution
    Inst. of Ind. Sci., Tokyo Univ., Japan
  • fYear
    1998
  • fDate
    6-9 Dec. 1998
  • Firstpage
    119
  • Lastpage
    122
  • Abstract
    Influences of quantum confinement effects on the device characteristics of single electron and single hole transistors are studied using Si narrow channel MOSFETs with both p/sup +/ and n/sup +/ source/drain contacts. Numerical calculations of the energy spectrum in silicon quantum dots are also carried out to support the experimental results. The obtained results indicate the difficulty in predicting the peak positions of the Coulomb blockade oscillations due to the quantum confinement effects in nanoscale devices. For the application of SETs, a, new method to adjust the peak position by injecting charges into silicon nano-crystals or traps is proposed and demonstrated.
  • Keywords
    Coulomb blockade; MOSFET; elemental semiconductors; nanotechnology; semiconductor quantum dots; silicon; single electron transistors; Coulomb blockade oscillations; Si; energy spectrum; n/sup +/ source/drain contacts; nano-crystals; narrow channel MOSFETs; p/sup +/ source/drain contacts; quantum confinement effects; quantum dots; single electron transistors; single hole transistors; Charge carrier processes; Electron traps; MOSFETs; Nanoscale devices; Potential well; Quantum dots; Silicon; Single electron transistors; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-4774-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1998.746293
  • Filename
    746293