DocumentCode :
2572433
Title :
Leakage current observation on irregular local PN junctions forming the tail distribution of DRAM retention characteristics, with new test structure
Author :
Ueno, T. ; Yamashita, T. ; Oda, H. ; Komori, S. ; Inoue, Y. ; Nishimura, T.
Author_Institution :
ULSI Dev. Center, Mitsubishi Electr. Corp., Itami, Japan
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
153
Lastpage :
156
Abstract :
The new test structure is proposed to observe the small leakage current for a large number of local PN junctions. This new structure makes it possible to catch the leaky cells corresponding to the tail distribution of the DRAM retention characteristics. It is found that the field enhanced thermionic emission is the leakage mechanism for both the leaky and conventional junctions. The leaky junctions are characterized by the small active energy of the traps in the depletion layer. Moreover, we observe the leakage characteristics corresponding to the DRAM bit with variable retention time. The kink phenomena can be observed in the leakage current while sweeping the voltage with trapping or detrapping the electrons from the traps.
Keywords :
DRAM chips; electron traps; integrated circuit testing; leakage currents; p-n junctions; thermionic electron emission; DRAM retention characteristics; active energy; depletion layer; detrapping; field enhanced thermionic emission; irregular local PN junctions; kink phenomena; leakage current observation; tail distribution; test structure; trapping; Current measurement; Electron traps; Leak detection; Leakage current; MOSFET circuits; Probability distribution; Random access memory; Testing; Time measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746305
Filename :
746305
Link To Document :
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