DocumentCode :
2572932
Title :
Non-LTE Kinetic Modeling of X-Pinches and Wire Arrays of Mo and Mo-Doped Ti Produced on the 1 MA Pulsed Power Generator at UNR
Author :
Yilmaz, F. ; Safronova, A. ; Kantsyrev, V. ; Fedin, D. ; Ouart, N. ; Cowan, T. ; LePell, D. ; Jones, B. ; Deeney, C. ; Hansen, S.
Author_Institution :
Dept. of Phys., Nevada Univ., Reno, NV
fYear :
2005
fDate :
20-23 June 2005
Firstpage :
310
Lastpage :
310
Abstract :
Summary form only given. Spatially resolved and integrated X-ray spectral data and time resolved and integrated pinhole X-ray images accumulated from Mo and Ti with doped Mo X-pinch experiments as well as Ti wire arrays with doped Mo experiments on the "Zebra" generator have been studied. In particular, symmetrical and asymmetrical Mo X-pinches with two and four wires of different diameters have been considered along with Ti X-pinches with 5-10% of Mo dopants. Also, Ti wire arrays with 5-10% of Mo dopants were analyzed. A non-LTE kinetic model of Mo has been applied to account for radiation from L-shell Mo ions. In particular, L-shell Mo radiation including both 2-3 and 2-4 transitions from symmetrical and asymmetrical Mo X-pinches with two wires and with four wires has been analyzed in detail and compared. In addition, L-shell Mo radiation from Mo dopants was modeled. Characteristic K-shell Mo radiation was monitored and analyzed for all Mo shots. The use of the wires coated with a small concentration of Mo for advanced diagnostics of X-pinch and wire array plasmas will be discussed. Resulting plasma parameters from modeling the L-shell Mo radiation from all considered Z-pinch and X-pinch loads with Mo will be presented and compared
Keywords :
Z pinch; molybdenum; plasma diagnostics; plasma kinetic theory; titanium; 1 MA; L-shell radiation; Mo; Ti:Mo; X pinches; X-ray spectra; Z-pinch; Zebra generator; nonLTE kinetic modeling; pinhole X-ray images; pulsed power generator; wire array plasmas; Image resolution; Kinetic theory; Plasma diagnostics; Plasma properties; Power generation; Pulse generation; Semiconductor process modeling; Spatial resolution; Wire; X-ray imaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
ISSN :
0730-9244
Print_ISBN :
0-7803-9300-7
Type :
conf
DOI :
10.1109/PLASMA.2005.359435
Filename :
4198694
Link To Document :
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