DocumentCode :
2574059
Title :
Real-time facial feature extraction using statistical shape model and Haar-wavelet based feature search
Author :
Zuo, Fei ; De With, Peter H N
Author_Institution :
Dept. of Electr. Eng., Eindhoven Univ. of Technol.
Volume :
2
fYear :
2004
fDate :
30-30 June 2004
Firstpage :
1443
Abstract :
We propose a fast facial feature extraction technique for an embedded face recognition system. The novel key element is a combination of a statistical shape model and the application of a Haar-wavelet based feature matching. Our statistical face model is based on the active shape model (ASM). However ASM lacks robustness to illumination changes and it has a limited convergence area. Instead of a 1D profile analysis, we propose a 2D texture pattern search-and-fitting scheme, which provides more robustness and faster convergence than conventional ASM. Furthermore, we employ Haar-wavelets to model local-facial textures, which yields two improvements: faster processing and more robustness with respect to low-quality images. Our proposed approach shows good results dealing with test face images, which are quite dissimilar with the faces used for statistical training. The convergence area of our proposed method almost quadruples compared to ASM, and the extraction accuracy is also improved. The total processing requires 30 - 70 ms, which is comparable to ASM, but faster than the active appearance model (AAM)
Keywords :
Haar transforms; convergence; face recognition; feature extraction; image matching; image texture; statistical analysis; 2D texture pattern search-and-fitting scheme; 30 to 70 ms; AAM; ASM convergence; Haar-wavelet based feature search; active appearance model; active shape model; embedded face recognition system; extraction accuracy; facial feature extraction; feature matching; local facial textures; low-quality images; real-time face recognition system; statistical shape model; Active appearance model; Active shape model; Convergence; Face recognition; Facial features; Image texture analysis; Lighting; Pattern analysis; Robustness; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Multimedia and Expo, 2004. ICME '04. 2004 IEEE International Conference on
Conference_Location :
Taipei
Print_ISBN :
0-7803-8603-5
Type :
conf
DOI :
10.1109/ICME.2004.1394506
Filename :
1394506
Link To Document :
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