DocumentCode :
2574673
Title :
Breakdown and low-temperature anomalous effects in 6H SiC JFETs
Author :
Meneghesso, G. ; Bartolini, A. ; Verzellesi, G. ; Cavallini, A. ; Castaldini, A. ; Canali, C. ; Zanoni, E.
Author_Institution :
Dipt. di Elettronica e Inf., Padova Univ., Italy
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
695
Lastpage :
698
Abstract :
The aim of this work is to describe experimental results concerning on-state weak ionization effects, off-state gate-drain breakdown phenomena and low-temperature electrical anomalies in buried-gate 6H SiC JFETs. We demonstrate that surface traps and deep impurity levels can give rise to anomalous phenomena such as I/sub D/-V/sub DS/ kinks in the drain current, dispersion of transconductance and negative thermal coefficient of breakdown voltage.
Keywords :
deep levels; electron traps; impact ionisation; junction gate field effect transistors; semiconductor device breakdown; semiconductor device measurement; semiconductor device reliability; semiconductor materials; silicon compounds; wide band gap semiconductors; SiC; buried-gate JFETs; deep impurity levels; drain current; low-temperature anomalous effects; negative thermal coefficient; off-state gate-drain breakdown phenomena; on-state weak ionization effects; surface traps; transconductance; Doping; Electric breakdown; Epitaxial growth; Ionization; JFETs; Nitrogen; Semiconductor impurities; Silicon carbide; Temperature; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746452
Filename :
746452
Link To Document :
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