Title :
Statistical modeling and circuit simulation for design for manufacturing
Author :
Smedes, T. ; Emonts, P.G.A.
Author_Institution :
Philips Semicond. MOS4YOU, Nijmegen, Netherlands
Abstract :
A method to include effects of statistical fluctuations, inherent to the semiconductor manufacturing process, in circuit simulation models is presented. It appears that several contributions must be distinguished for a correct statistical model. The benefit over traditional best/worst case modeling is shown. The relation between statistical modeling and process control is discussed.
Keywords :
circuit simulation; design for manufacture; fluctuations; integrated circuit design; integrated circuit manufacture; integrated circuit modelling; process control; semiconductor process modelling; statistical analysis; circuit simulation; design for manufacturing; process control; semiconductor manufacturing process; statistical fluctuations; statistical modeling; Circuit simulation; Design for manufacture; Design optimization; Fluctuations; Manufacturing processes; Process control; Robustness; Semiconductor device manufacture; Semiconductor device modeling; Virtual manufacturing;
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-4774-9
DOI :
10.1109/IEDM.1998.746468
