DocumentCode :
2575389
Title :
Energy dependent electron and hole impact ionization in Si bipolar transistors
Author :
Palestri, P. ; Selmi, L. ; Hurkx, Godefridus Adrianus Maria ; Slotboom, J.W. ; Sangiorgi, E.
Author_Institution :
DIEGM, Udine, Italy
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
885
Lastpage :
888
Abstract :
This paper describes a self-consistent procedure to extract energy dependent electron (/spl alpha/) and hole (/spl beta/) ionization coefficients directly from electrical measurements of multiplication factors (M/sub n/ and M/sub p/, respectively) carried out on a single reversed junction in a bipolar device. The extracted /spl alpha/ and /spl beta/ coefficients are used to accurately calculate breakdown voltages in a variety of bipolar devices. Results point out the role of holes and of non-local hole heating on the avalanche characteristics of modern bipolar devices.
Keywords :
avalanche breakdown; bipolar transistors; elemental semiconductors; impact ionisation; semiconductor device breakdown; semiconductor device reliability; silicon; Si; avalanche characteristics; bipolar transistors; breakdown voltages; electron impact ionization; energy dependent impact ionization; hole impact ionization; ionization coefficients; multiplication factors; nonlocal hole heating; self-consistent procedure; single reversed junction; Bipolar transistors; Charge carrier processes; Charge measurement; Current measurement; Electric variables measurement; Electrical resistance measurement; Energy measurement; Heating; Impact ionization; Laboratories;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746496
Filename :
746496
Link To Document :
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