An innovative method for contact hole printing with binary mask and single exposure

In 2002, Canon introduced a new method for contact-hole printing, using a binary mask and single exposure, entitled IDEALSmile (Innovative Double Effective source Aided Lithography with Single Mask Implemented Lithographic Enhancement)). IDEALSmile demonstrated its significant potential for k/sub 1/=0.3 lithography of contact hole patterns. Since then, additional fundamental experiments, such as through-pitch performance, and process applications, were performed to verify the potential effects of IDEALSmile. We have now developed a new type of IDEALSmile by rearranging the dummy patterns and manipulating the diffracted light on the pupil plane. In this paper we will review the principle of IDEALSmile in detail and introduce the new IDEALSmile configuration.