Multitarget sputtering of PZT-containing mixed oxide thin films onto copper-coated Kapton substrates

Author

Kleiner, Alexander ; Suchaneck, G. ; Dejneka, A. ; Jastrabik, L. ; Lavrentiev, V. ; Kiselev, D.A. ; Gerlach, G.

Author_Institution

Tech. Univ. Dresden, Dresden, Germany

fYear

2014

fDate

26-30 May 2014

Firstpage

19

Lastpage

20

Abstract

Large area film deposition was performed by means of multitarget reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr) onto Cu-coated Kapton HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.

Keywords

Rutherford backscattering; X-ray photoelectron spectra; lead compounds; nanofabrication; nanostructured materials; piezoelectric thin films; sputter deposition; PFM; PZT; PZT-containing mixed oxide thin films; RES; XPS; copper-coated kapton substrates; high-power pulse sputtering; large area film deposition; multitarget reactive magnetron sputtering; piezoelectric properties; size 200 nm; Substrates; X-ray scattering; Complex oxide film deposition; PZT; composition profile; flexible polymer substrate; multitarget reactive sputtering; piezoresponse force microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Oxide Materials for Electronic Engineering (OMEE), 2014 IEEE International Conference on

Conference_Location

Lviv

Print_ISBN

978-1-4799-5960-0

Type

conf

DOI

10.1109/OMEE.2014.6912320

Filename

6912320