Title :
Quantitative evaluation of grid size effect on CD uniformity improvement
Author :
Doo-Youl Lee ; Sung-Woo Lee ; Gi-Sung Yeo ; Jung-Hyeon Lee ; Han-Ku Cho ; Woo-Sung Han
Author_Institution :
Semicond. R&D Center, Samsung Electron., Gyeonggi-Do, South Korea
Abstract :
In this paper, evaluation of grid size effect on CD uniformity was investigated. The reduction of the grid size can more elaborately correct CD variation by reducing the local mask uniformity and is expected to decrease the error portion and improve CD uniformity.
Keywords :
masks; semiconductor devices; swelling; CD uniformity; CD variation; data handling; error portion; grid size effect; mask; semiconductor devices; swelling; Data handling; Electronic mail; Error correction; Mesh generation; Printing; Random access memory; Research and development; Size control; Size measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268506
