DocumentCode
2577136
Title
Quantitative evaluation of grid size effect on CD uniformity improvement
Author
Doo-Youl Lee ; Sung-Woo Lee ; Gi-Sung Yeo ; Jung-Hyeon Lee ; Han-Ku Cho ; Woo-Sung Han
Author_Institution
Semicond. R&D Center, Samsung Electron., Gyeonggi-Do, South Korea
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
36
Lastpage
37
Abstract
In this paper, evaluation of grid size effect on CD uniformity was investigated. The reduction of the grid size can more elaborately correct CD variation by reducing the local mask uniformity and is expected to decrease the error portion and improve CD uniformity.
Keywords
masks; semiconductor devices; swelling; CD uniformity; CD variation; data handling; error portion; grid size effect; mask; semiconductor devices; swelling; Data handling; Electronic mail; Error correction; Mesh generation; Printing; Random access memory; Research and development; Size control; Size measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268506
Filename
1268506
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