Title :
Characterized optical constants of thin films for vacuum ultraviolet lithography applications
Author :
Fan, W. ; Chen, H.L. ; Wu, C.L. ; Chang, L.K.S.
Author_Institution :
Nat. Nano Device Lab., Hsinchu, Taiwan
Abstract :
In this paper, optical constants (refractive index, extinction coefficient) of thin films for vacuum ultraviolet lithography application have been investigated.
Keywords :
aluminium; extinction coefficients; refractive index; silicon compounds; thin films; ultraviolet lithography; Al; SiN; SiO/sub 2/; extinction coefficient; optical constants; refractive index; thin films; vacuum ultraviolet lithography; Coatings; Lithography; Optical films; Optical materials; Optical refraction; Optical variables control; Reflectivity; Resists; Semiconductor films; Silicon;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268507
