• DocumentCode
    2577209
  • Title

    Bent-beam electro-thermal actuators for high force applications

  • Author

    Que, L. ; Park, J.-S. ; Gianchandani, Y.B.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1999
  • fDate
    21-21 Jan. 1999
  • Firstpage
    31
  • Lastpage
    36
  • Abstract
    This paper describes in-plane microactuators fabricated by standard microsensor materials and processes that can generate forces up to about a milli-newton. They operate by leveraging the deformations produced by localized thermal stresses. Analytical and finite element models of device performance are presented along with measured results of fabricated devices using electroplated Ni, LPCVD polysilicon, and p/sup ++/ Si as structural materials. A maskless process extension for incorporating thermal and electrical isolation is outlined. Test results show that static displacements of /spl ap/10 /spl mu/m can be achieved with power dissipation of /spl ap/100 mW, and output forces >300 /spl mu/N can be achieved with input power <250 mW. It is also shown that cascaded devices offer a 4/spl times/ improvement in displacement. The displacements are rectilinear, and the output forces generated are 10/spl times/-100/spl times/ higher than those available from other comparable options. This performance is achieved at much lower drive voltages than necessary for electrostatic actuation, indicating that bent-beam thermal actuators are suitable for integration in a variety of microsystems.
  • Keywords
    bending; chemical vapour deposition; electroplating; etching; finite element analysis; isolation technology; microactuators; micromachining; semiconductor device models; thermal expansion; thermal stresses; LPCVD polysilicon; Ni; Si; bent-beam electrothermal actuators; cascaded devices; deformations leveraging; device fabrication; device performance; electrical isolation; electroplated Ni; finite element models; high force applications; in-plane microactuators; localized thermal stresses; maskless process extension; microsystems integration; p/sup ++/ Si; rectilinear displacements; sacrificial layer etch; static displacements; suspended micromachined structures; thermal expansion; thermal isolation; Application software; Electrostatic actuators; Magnetic materials; Microactuators; Microsensors; Phase change materials; Piezoelectric actuators; Testing; Thermal stresses; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
  • Conference_Location
    Orlando, FL, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-5194-0
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1999.746747
  • Filename
    746747