DocumentCode
2577209
Title
Bent-beam electro-thermal actuators for high force applications
Author
Que, L. ; Park, J.-S. ; Gianchandani, Y.B.
Author_Institution
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fYear
1999
fDate
21-21 Jan. 1999
Firstpage
31
Lastpage
36
Abstract
This paper describes in-plane microactuators fabricated by standard microsensor materials and processes that can generate forces up to about a milli-newton. They operate by leveraging the deformations produced by localized thermal stresses. Analytical and finite element models of device performance are presented along with measured results of fabricated devices using electroplated Ni, LPCVD polysilicon, and p/sup ++/ Si as structural materials. A maskless process extension for incorporating thermal and electrical isolation is outlined. Test results show that static displacements of /spl ap/10 /spl mu/m can be achieved with power dissipation of /spl ap/100 mW, and output forces >300 /spl mu/N can be achieved with input power <250 mW. It is also shown that cascaded devices offer a 4/spl times/ improvement in displacement. The displacements are rectilinear, and the output forces generated are 10/spl times/-100/spl times/ higher than those available from other comparable options. This performance is achieved at much lower drive voltages than necessary for electrostatic actuation, indicating that bent-beam thermal actuators are suitable for integration in a variety of microsystems.
Keywords
bending; chemical vapour deposition; electroplating; etching; finite element analysis; isolation technology; microactuators; micromachining; semiconductor device models; thermal expansion; thermal stresses; LPCVD polysilicon; Ni; Si; bent-beam electrothermal actuators; cascaded devices; deformations leveraging; device fabrication; device performance; electrical isolation; electroplated Ni; finite element models; high force applications; in-plane microactuators; localized thermal stresses; maskless process extension; microsystems integration; p/sup ++/ Si; rectilinear displacements; sacrificial layer etch; static displacements; suspended micromachined structures; thermal expansion; thermal isolation; Application software; Electrostatic actuators; Magnetic materials; Microactuators; Microsensors; Phase change materials; Piezoelectric actuators; Testing; Thermal stresses; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location
Orlando, FL, USA
ISSN
1084-6999
Print_ISBN
0-7803-5194-0
Type
conf
DOI
10.1109/MEMSYS.1999.746747
Filename
746747
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