DocumentCode :
2577310
Title :
Fabrication of accelerometer using single-step electrochemical etching for micro structures (SEEMS)
Author :
Ohji, H. ; Gennissen, P.T.J. ; French, P.J. ; Tsutsumi, K.
Author_Institution :
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear :
1999
fDate :
21-21 Jan. 1999
Firstpage :
61
Lastpage :
65
Abstract :
This paper presents a new wet etching technique for micromachining called SEEMS (Single-step Electrochemical Etching for Micro Structures). An accelerometer structure can be achieved using this SEEMS process. However, some problems which are involved in the SEEMS process had to be solved. The two main problems are: firstly, over etching can be seen at the clamping point of freestanding beam, and secondly, from the theoretical point of view, it is difficult to remove large region or to make one hole in a large area. These problems can be considerably reduced by improved mask layout and perforated mass supported by single cantilever can be achieved. Additionally, new initial pit formation is demonstrated to make structures which are free from crystal orientation of silicon substrate.
Keywords :
accelerometers; elemental semiconductors; etching; micromachining; microsensors; porous semiconductors; silicon; SEEMS technique; Si; accelerometer fabrication; clamping point; freestanding beam; improved mask layout; initial pit formation; large area removal; micromachining; microstructures; over etching; perforated mass; process flow; single cantilever; single-step electrochemical etching; wet etching technique; Accelerometers; Clamps; Fabrication; Mechanical factors; Micromachining; Micromechanical devices; Research and development; Silicon; Temperature; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location :
Orlando, FL, USA
ISSN :
1084-6999
Print_ISBN :
0-7803-5194-0
Type :
conf
DOI :
10.1109/MEMSYS.1999.746753
Filename :
746753
Link To Document :
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